SiO2 film thickness metrology by x-ray photoelectron spectroscopy

Z. H. Lu, J. P. McCaffrey, B. Brar, G. D. Wilk, R. M. Wallace, L. C. Feldman, S. P. Tay

Research output: Contribution to journalArticle

212 Citations (Scopus)

Abstract

Silicon dioxide films grown by industrial thermal furnace, rapid thermal, and low-pressure thermal methods were measured by x-ray photoelectron spectroscopy, transmission electron microscopy (TEM), spectroscopic ellipsometry, and capacitance-voltage analysis. Based on TEM measurements, the photoelectron effective attenuation lengths in the SiO2 and Si are found to be 2.96±0.19 and 2.11±0.13 nm, respectively. The oxide physical thicknesses (range from 1.5 to 12.5 nm) as measured by all above techniques are in good agreement. The electrical thickness is noted to be slightly thicker than the physical thickness.

Original languageEnglish
Pages (from-to)2764-2766
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number19
DOIs
Publication statusPublished - Nov 10 1997

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'SiO<sub>2</sub> film thickness metrology by x-ray photoelectron spectroscopy'. Together they form a unique fingerprint.

  • Cite this

    Lu, Z. H., McCaffrey, J. P., Brar, B., Wilk, G. D., Wallace, R. M., Feldman, L. C., & Tay, S. P. (1997). SiO2 film thickness metrology by x-ray photoelectron spectroscopy. Applied Physics Letters, 71(19), 2764-2766. https://doi.org/10.1063/1.120438