Soft x-ray photoemission studies of Hf oxidation

S. Suzer, S. Sayan, M. M. Banaszak Holl, Eric Garfunkel, Z. Hussain, N. M. Hamdan

Research output: Contribution to journalArticle

79 Citations (Scopus)

Abstract

Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

Original languageEnglish
Pages (from-to)106-109
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number1
DOIs
Publication statusPublished - Jan 2003

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Photoemission
Binding energy
photoelectric emission
binding energy
X rays
Oxidation
oxidation
Core levels
Valence bands
Oxide films
charging
oxide films
x rays
Annealing
valence
annealing

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Soft x-ray photoemission studies of Hf oxidation. / Suzer, S.; Sayan, S.; Banaszak Holl, M. M.; Garfunkel, Eric; Hussain, Z.; Hamdan, N. M.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 21, No. 1, 01.2003, p. 106-109.

Research output: Contribution to journalArticle

Suzer, S. ; Sayan, S. ; Banaszak Holl, M. M. ; Garfunkel, Eric ; Hussain, Z. ; Hamdan, N. M. / Soft x-ray photoemission studies of Hf oxidation. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2003 ; Vol. 21, No. 1. pp. 106-109.
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