Soft x-ray photoemission studies of Hf oxidation

S. Suzer, S. Sayan, M. M. Banaszak Holl, E. Garfunkel, Z. Hussain, N. M. Hamdan

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Abstract

Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

Original languageEnglish
Pages (from-to)106-109
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number1
DOIs
Publication statusPublished - Jan 1 2003

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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