Spatially controlled atomic layer deposition in porous materials

J. W. Elam, J. A. Libera, M. J. Pellin, Peter C Stair

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

We describe a technique for depositing materials at controlled depths within porous substrates based upon the passivating effect produced by one precursor to prevent the adsorption of a second precursor. For example, a surface exposed to trimethyl aluminum is not reactive toward diethyl zinc. This effect, combined with Knudsen diffusion in which the precursor exposure times dictate the depth of penetration of the deposited layer, enables spatially controlled "stripe coating" within porous supports. We demonstrate ZnO stripes in anodic alumina and model the results using Monte Carlo simulations. Etching is identified as a potential problem for certain precursor combinations.

Original languageEnglish
Article number243105
JournalApplied Physics Letters
Volume91
Issue number24
DOIs
Publication statusPublished - 2007

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porous materials
atomic layer epitaxy
penetration
aluminum oxides
zinc
etching
aluminum
coatings
adsorption
simulation

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Spatially controlled atomic layer deposition in porous materials. / Elam, J. W.; Libera, J. A.; Pellin, M. J.; Stair, Peter C.

In: Applied Physics Letters, Vol. 91, No. 24, 243105, 2007.

Research output: Contribution to journalArticle

Elam, J. W. ; Libera, J. A. ; Pellin, M. J. ; Stair, Peter C. / Spatially controlled atomic layer deposition in porous materials. In: Applied Physics Letters. 2007 ; Vol. 91, No. 24.
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