Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy

Forrest H. Kaatz, Paul R. Markworth, Ji Yan Dai, D. Bruce Buchholz, Xiang Liu, Michael P. Chudzik, John A. Belot, Carl R. Kannewurf, Tobin J Marks, Robert P. H. Chang

Research output: Contribution to journalArticle

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)99-102
Number of pages4
JournalChemical Vapor Deposition
Volume4
Issue number3
Publication statusPublished - May 1998

Fingerprint

Yttrium compounds
yttrium compounds
High temperature superconductors
Organometallics
Epitaxial growth
zirconium oxides
crystal lattices
Electron diffraction
Crystal lattices
high temperature superconductors
Crystal orientation
Zirconia
epitaxy
electron diffraction
zirconium oxide
barium copper yttrium oxide

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Kaatz, F. H., Markworth, P. R., Dai, J. Y., Buchholz, D. B., Liu, X., Chudzik, M. P., ... Chang, R. P. H. (1998). Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy. Chemical Vapor Deposition, 4(3), 99-102.

Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy. / Kaatz, Forrest H.; Markworth, Paul R.; Dai, Ji Yan; Buchholz, D. Bruce; Liu, Xiang; Chudzik, Michael P.; Belot, John A.; Kannewurf, Carl R.; Marks, Tobin J; Chang, Robert P. H.

In: Chemical Vapor Deposition, Vol. 4, No. 3, 05.1998, p. 99-102.

Research output: Contribution to journalArticle

Kaatz, FH, Markworth, PR, Dai, JY, Buchholz, DB, Liu, X, Chudzik, MP, Belot, JA, Kannewurf, CR, Marks, TJ & Chang, RPH 1998, 'Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy', Chemical Vapor Deposition, vol. 4, no. 3, pp. 99-102.
Kaatz FH, Markworth PR, Dai JY, Buchholz DB, Liu X, Chudzik MP et al. Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy. Chemical Vapor Deposition. 1998 May;4(3):99-102.
Kaatz, Forrest H. ; Markworth, Paul R. ; Dai, Ji Yan ; Buchholz, D. Bruce ; Liu, Xiang ; Chudzik, Michael P. ; Belot, John A. ; Kannewurf, Carl R. ; Marks, Tobin J ; Chang, Robert P. H. / Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy. In: Chemical Vapor Deposition. 1998 ; Vol. 4, No. 3. pp. 99-102.
@article{70c5d69be16b46aeac3f2436642dee4b,
title = "Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy",
author = "Kaatz, {Forrest H.} and Markworth, {Paul R.} and Dai, {Ji Yan} and Buchholz, {D. Bruce} and Xiang Liu and Chudzik, {Michael P.} and Belot, {John A.} and Kannewurf, {Carl R.} and Marks, {Tobin J} and Chang, {Robert P. H.}",
year = "1998",
month = "5",
language = "English",
volume = "4",
pages = "99--102",
journal = "Chemical Vapor Deposition",
issn = "0948-1907",
publisher = "Wiley-VCH Verlag",
number = "3",

}

TY - JOUR

T1 - Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy

AU - Kaatz, Forrest H.

AU - Markworth, Paul R.

AU - Dai, Ji Yan

AU - Buchholz, D. Bruce

AU - Liu, Xiang

AU - Chudzik, Michael P.

AU - Belot, John A.

AU - Kannewurf, Carl R.

AU - Marks, Tobin J

AU - Chang, Robert P. H.

PY - 1998/5

Y1 - 1998/5

UR - http://www.scopus.com/inward/record.url?scp=0032075429&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032075429&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0032075429

VL - 4

SP - 99

EP - 102

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

SN - 0948-1907

IS - 3

ER -