Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy

Forrest H. Kaatz, Paul R. Markworth, Ji Yan Dai, D. Bruce Buchholz, Xiang Liu, Michael P. Chudzik, John A. Belot, Carl R. Kannewurf, Tobin J Marks, Robert P. H. Chang

Research output: Contribution to journalArticle

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)99-102
Number of pages4
JournalChemical Vapor Deposition
Volume4
Issue number3
Publication statusPublished - May 1998

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Kaatz, F. H., Markworth, P. R., Dai, J. Y., Buchholz, D. B., Liu, X., Chudzik, M. P., Belot, J. A., Kannewurf, C. R., Marks, T. J., & Chang, R. P. H. (1998). Stability of Bilayer Films of YBa2Cu3O7 and Y-ZrO2 Grown on LaAlO3 by Pulsed Organometallic Beam Epitaxy. Chemical Vapor Deposition, 4(3), 99-102.