Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films

Ke Sun; Fadl H. Saadi; Michael F. Lichterman; William G. Hale; Hsin Ping Wang; Xinghao Zhou; Noah T. Plymale; Stefan T. Omelchenko; Jr Hau He; Kimberly M. Papadantonakis; Bruce S. Brunschwig; Nathan S. Lewis

doi:10.1073/pnas.1423034112

Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films

Ke Sun, Fadl H. Saadi, Michael F. Lichterman, William G. Hale, Hsin Ping Wang, Xinghao Zhou, Noah T. Plymale, Stefan T. Omelchenko, Jr Hau He, Kimberly M. Papadantonakis, Bruce S. Brunschwig, Nathan S. Lewis

California Institute of Technology

Research output: Contribution to journal › Article

128 Citations (Scopus)

Abstract

Reactively sputtered nickel oxide (NiO_x) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O₂(g). These NiO_x coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiO_x films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O₂(g).

Original language	English
Pages (from-to)	3612-3617
Number of pages	6
Journal	Proceedings of the National Academy of Sciences of the United States of America
Volume	112
Issue number	12
DOIs	https://doi.org/10.1073/pnas.1423034112
Publication status	Published - Mar 24 2015

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Keywords

Electrocatalysis
Nickel oxide
Photoanode stabilization
Solar-driven water oxidation

ASJC Scopus subject areas

General

Cite this

Sun, K., Saadi, F. H., Lichterman, M. F., Hale, W. G., Wang, H. P., Zhou, X., Plymale, N. T., Omelchenko, S. T., He, J. H., Papadantonakis, K. M., Brunschwig, B. S., & Lewis, N. S. (2015). Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films. Proceedings of the National Academy of Sciences of the United States of America, 112(12), 3612-3617. https://doi.org/10.1073/pnas.1423034112

Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films. / Sun, Ke; Saadi, Fadl H.; Lichterman, Michael F.; Hale, William G.; Wang, Hsin Ping; Zhou, Xinghao; Plymale, Noah T.; Omelchenko, Stefan T.; He, Jr Hau; Papadantonakis, Kimberly M.; Brunschwig, Bruce S.; Lewis, Nathan S.

In: Proceedings of the National Academy of Sciences of the United States of America, Vol. 112, No. 12, 24.03.2015, p. 3612-3617.

Research output: Contribution to journal › Article

Sun, K, Saadi, FH, Lichterman, MF, Hale, WG, Wang, HP, Zhou, X, Plymale, NT, Omelchenko, ST, He, JH, Papadantonakis, KM, Brunschwig, BS & Lewis, NS 2015, 'Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films', Proceedings of the National Academy of Sciences of the United States of America, vol. 112, no. 12, pp. 3612-3617. https://doi.org/10.1073/pnas.1423034112

Sun, Ke ; Saadi, Fadl H. ; Lichterman, Michael F. ; Hale, William G. ; Wang, Hsin Ping ; Zhou, Xinghao ; Plymale, Noah T. ; Omelchenko, Stefan T. ; He, Jr Hau ; Papadantonakis, Kimberly M. ; Brunschwig, Bruce S. ; Lewis, Nathan S. / Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films. In: Proceedings of the National Academy of Sciences of the United States of America. 2015 ; Vol. 112, No. 12. pp. 3612-3617.

@article{a0ae28b0571244d3bcb934a307c42763,

title = "Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films",

abstract = "Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g).",

keywords = "Electrocatalysis, Nickel oxide, Photoanode stabilization, Solar-driven water oxidation",

author = "Ke Sun and Saadi, {Fadl H.} and Lichterman, {Michael F.} and Hale, {William G.} and Wang, {Hsin Ping} and Xinghao Zhou and Plymale, {Noah T.} and Omelchenko, {Stefan T.} and He, {Jr Hau} and Papadantonakis, {Kimberly M.} and Brunschwig, {Bruce S.} and Lewis, {Nathan S.}",

year = "2015",

month = mar

day = "24",

doi = "10.1073/pnas.1423034112",

language = "English",

volume = "112",

pages = "3612--3617",

journal = "Proceedings of the National Academy of Sciences of the United States of America",

issn = "0027-8424",

number = "12",

}

TY - JOUR

T1 - Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films

AU - Sun, Ke

AU - Saadi, Fadl H.

AU - Lichterman, Michael F.

AU - Hale, William G.

AU - Wang, Hsin Ping

AU - Zhou, Xinghao

AU - Plymale, Noah T.

AU - Omelchenko, Stefan T.

AU - He, Jr Hau

AU - Papadantonakis, Kimberly M.

AU - Brunschwig, Bruce S.

AU - Lewis, Nathan S.

PY - 2015/3/24

Y1 - 2015/3/24

N2 - Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g).

AB - Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g).

KW - Electrocatalysis

KW - Nickel oxide

KW - Photoanode stabilization

KW - Solar-driven water oxidation

UR - http://www.scopus.com/inward/record.url?scp=84925428446&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84925428446&partnerID=8YFLogxK

U2 - 10.1073/pnas.1423034112

DO - 10.1073/pnas.1423034112

M3 - Article

AN - SCOPUS:84925428446

VL - 112

SP - 3612

EP - 3617

JO - Proceedings of the National Academy of Sciences of the United States of America

JF - Proceedings of the National Academy of Sciences of the United States of America

SN - 0027-8424

IS - 12

ER -

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10.1073/pnas.1423034112