Stationary carbon cathodic arc

Plasma and film characterization

Manish Chhowalla, C. A. Davis, M. Weiler, B. Kleinsorge, G. A J Amaratunga

Research output: Contribution to journalArticle

41 Citations (Scopus)

Abstract

The plasma characteristics of a new arc mode on carbon referred to as the "stationary cathodic arc" are reported. Particularly, optical emission spectroscopy, probe and ion energy distribution measurements are used to compare the properties of the stationary arc with the normal "random cathodic arc" on carbon. The measurements revealed that the plasma properties of both arc modes are similar. In addition, we have correlated the plasma characteristics to the film properties. Carbon films deposited using the stationary arc were found to have a surface particle density equivalent to those deposited using the filtered cathodic vacuum arc. The macro-particle free films were found to be highly tetrahedral and compressively stressed. Both the sp3 fraction and stress values were strongly dependent on the ion energy with maximum values of 85% and 9.4 GPa, respectively, occurring at ≈50 eV

Original languageEnglish
Pages (from-to)2237-2244
Number of pages8
JournalJournal of Applied Physics
Volume79
Issue number5
Publication statusPublished - Mar 1 1996

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plasma jets
arcs
carbon
optical emission spectroscopy
energy distribution
ions
vacuum
probes

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Chhowalla, M., Davis, C. A., Weiler, M., Kleinsorge, B., & Amaratunga, G. A. J. (1996). Stationary carbon cathodic arc: Plasma and film characterization. Journal of Applied Physics, 79(5), 2237-2244.

Stationary carbon cathodic arc : Plasma and film characterization. / Chhowalla, Manish; Davis, C. A.; Weiler, M.; Kleinsorge, B.; Amaratunga, G. A J.

In: Journal of Applied Physics, Vol. 79, No. 5, 01.03.1996, p. 2237-2244.

Research output: Contribution to journalArticle

Chhowalla, M, Davis, CA, Weiler, M, Kleinsorge, B & Amaratunga, GAJ 1996, 'Stationary carbon cathodic arc: Plasma and film characterization', Journal of Applied Physics, vol. 79, no. 5, pp. 2237-2244.
Chhowalla M, Davis CA, Weiler M, Kleinsorge B, Amaratunga GAJ. Stationary carbon cathodic arc: Plasma and film characterization. Journal of Applied Physics. 1996 Mar 1;79(5):2237-2244.
Chhowalla, Manish ; Davis, C. A. ; Weiler, M. ; Kleinsorge, B. ; Amaratunga, G. A J. / Stationary carbon cathodic arc : Plasma and film characterization. In: Journal of Applied Physics. 1996 ; Vol. 79, No. 5. pp. 2237-2244.
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