Strongly adhering and thick highly tetrahedral amorphous carbon (ta-C) thin films via surface modification by implantation

Manish Chhowalla, G. A J Amaratunga

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Highly tetrahedral amorphous carbon thin films have exceptional mechanical properties that make them ideal for many challenging wear applications such as protective overcoats for orthopaedic prostheses and aerospace components. However, the use of ta-C in many wear applications is limited due to the poor adhesion and the inability to grow thick films because of the large compressive stress. Here we report on a simple modification of the substrate growth surface by 1-keV ion bombardment using a cathodic vacuum arc (CVA) plasma prior to deposition of ta-C films at 100 eV. The 1-keV C+ ion bombardment created a thin intermixed layer consisting of substrate and carbon atoms. The generation of the intermixed carbide layer improved the adhesion and allowed the growth of thick (several μm) ta-C layers on metallic substrates.

Original languageEnglish
Pages (from-to)5-8
Number of pages4
JournalJournal of Materials Research
Volume16
Issue number1
Publication statusPublished - Jan 2001

Fingerprint

Carbon films
Amorphous carbon
Surface treatment
implantation
Thin films
carbon
thin films
Ion bombardment
Substrates
Adhesion
Wear of materials
bombardment
adhesion
Orthopedics
Amorphous films
Prosthetics
orthopedics
Compressive stress
Thick films
Carbides

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Strongly adhering and thick highly tetrahedral amorphous carbon (ta-C) thin films via surface modification by implantation. / Chhowalla, Manish; Amaratunga, G. A J.

In: Journal of Materials Research, Vol. 16, No. 1, 01.2001, p. 5-8.

Research output: Contribution to journalArticle

@article{5aa242ec103045a18ce4f8f33cf2ec85,
title = "Strongly adhering and thick highly tetrahedral amorphous carbon (ta-C) thin films via surface modification by implantation",
abstract = "Highly tetrahedral amorphous carbon thin films have exceptional mechanical properties that make them ideal for many challenging wear applications such as protective overcoats for orthopaedic prostheses and aerospace components. However, the use of ta-C in many wear applications is limited due to the poor adhesion and the inability to grow thick films because of the large compressive stress. Here we report on a simple modification of the substrate growth surface by 1-keV ion bombardment using a cathodic vacuum arc (CVA) plasma prior to deposition of ta-C films at 100 eV. The 1-keV C+ ion bombardment created a thin intermixed layer consisting of substrate and carbon atoms. The generation of the intermixed carbide layer improved the adhesion and allowed the growth of thick (several μm) ta-C layers on metallic substrates.",
author = "Manish Chhowalla and Amaratunga, {G. A J}",
year = "2001",
month = "1",
language = "English",
volume = "16",
pages = "5--8",
journal = "Journal of Materials Research",
issn = "0884-2914",
publisher = "Materials Research Society",
number = "1",

}

TY - JOUR

T1 - Strongly adhering and thick highly tetrahedral amorphous carbon (ta-C) thin films via surface modification by implantation

AU - Chhowalla, Manish

AU - Amaratunga, G. A J

PY - 2001/1

Y1 - 2001/1

N2 - Highly tetrahedral amorphous carbon thin films have exceptional mechanical properties that make them ideal for many challenging wear applications such as protective overcoats for orthopaedic prostheses and aerospace components. However, the use of ta-C in many wear applications is limited due to the poor adhesion and the inability to grow thick films because of the large compressive stress. Here we report on a simple modification of the substrate growth surface by 1-keV ion bombardment using a cathodic vacuum arc (CVA) plasma prior to deposition of ta-C films at 100 eV. The 1-keV C+ ion bombardment created a thin intermixed layer consisting of substrate and carbon atoms. The generation of the intermixed carbide layer improved the adhesion and allowed the growth of thick (several μm) ta-C layers on metallic substrates.

AB - Highly tetrahedral amorphous carbon thin films have exceptional mechanical properties that make them ideal for many challenging wear applications such as protective overcoats for orthopaedic prostheses and aerospace components. However, the use of ta-C in many wear applications is limited due to the poor adhesion and the inability to grow thick films because of the large compressive stress. Here we report on a simple modification of the substrate growth surface by 1-keV ion bombardment using a cathodic vacuum arc (CVA) plasma prior to deposition of ta-C films at 100 eV. The 1-keV C+ ion bombardment created a thin intermixed layer consisting of substrate and carbon atoms. The generation of the intermixed carbide layer improved the adhesion and allowed the growth of thick (several μm) ta-C layers on metallic substrates.

UR - http://www.scopus.com/inward/record.url?scp=0035239675&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035239675&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0035239675

VL - 16

SP - 5

EP - 8

JO - Journal of Materials Research

JF - Journal of Materials Research

SN - 0884-2914

IS - 1

ER -