Suitability of metalorganic chemical vapor deposition-derived PrGaO 3 films as buffer layers for YBa2Cu3O 7-x pulsed laser deposition

Bin Han, Deborah A. Neumayer, Tobin J Marks, David A. Rudman, Hong Zhang, Vinayak P. Dravid

Research output: Contribution to journalArticle

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Abstract

Phase-pure thin films of the YBa2Cu3O7-x (YBCO) lattice matched and low loss tangent perovskite insulator PrGaO 3 have been grown in situ on single-crystal (110) LaAlO3 substrates by metalorganic chemical vapor deposition (MOCVD). Films were grown at temperatures of 750-800°C using β-diketonate precursors M(dpm) 3 (M=Pr,Ga; dpm =dipivaloylmethanate). YBCO films were then grown on the MOCVD-derived PrGaO3 by pulsed laser deposition (PLD). Scanning electron microscopy reveals that the PrGaO3 films have smooth, featureless surfaces. As assessed by x-ray diffraction, the PrGaO3 films grow epitaxially on LaAlO3 with a high degree of (001) and/or (110) plane orientation parallel to the substrate surface, and the subsequent YBCO films grow with a (00l) orientation. Rocking curve and φ-scan analyses reveal that the PrGaO3 and YBCO films grow epitaxially. Cross-sectional high resolution electron microscopy and transmission electron microscopic selected area diffraction confirm that the PrGaO3 and YBCO layers grow epitaxially. YBCO films grown by PLD on the MOCVD-derived PrGaO3 exhibit Tc=91 K and Jc=6×10 6 A/cm2 at 77 K in zero field.

Original languageEnglish
Pages (from-to)3639-3641
Number of pages3
JournalApplied Physics Letters
Volume63
Issue number26
DOIs
Publication statusPublished - 1993

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pulsed laser deposition
metalorganic chemical vapor deposition
buffers
tangents
electron microscopy
x ray diffraction
insulators
scanning electron microscopy
high resolution
single crystals
curves
thin films
diffraction
electrons

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Suitability of metalorganic chemical vapor deposition-derived PrGaO 3 films as buffer layers for YBa2Cu3O 7-x pulsed laser deposition. / Han, Bin; Neumayer, Deborah A.; Marks, Tobin J; Rudman, David A.; Zhang, Hong; Dravid, Vinayak P.

In: Applied Physics Letters, Vol. 63, No. 26, 1993, p. 3639-3641.

Research output: Contribution to journalArticle

Han, Bin ; Neumayer, Deborah A. ; Marks, Tobin J ; Rudman, David A. ; Zhang, Hong ; Dravid, Vinayak P. / Suitability of metalorganic chemical vapor deposition-derived PrGaO 3 films as buffer layers for YBa2Cu3O 7-x pulsed laser deposition. In: Applied Physics Letters. 1993 ; Vol. 63, No. 26. pp. 3639-3641.
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