Summary Abstract: Plasma-enhanced beam deposition of thin dielectric films

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)717-718
Number of pages2
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume1
Issue number2
DOIs
Publication statusPublished - 1983

Fingerprint

Dielectric films
Plasmas
Thin films

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

@article{699171f0d58f437999219c6d61813c49,
title = "Summary Abstract: Plasma-enhanced beam deposition of thin dielectric films",
author = "Chang, {Robert P. H.} and S. Darack",
year = "1983",
doi = "10.1116/1.571986",
language = "English",
volume = "1",
pages = "717--718",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "2",

}

TY - JOUR

T1 - Summary Abstract

T2 - Plasma-enhanced beam deposition of thin dielectric films

AU - Chang, Robert P. H.

AU - Darack, S.

PY - 1983

Y1 - 1983

UR - http://www.scopus.com/inward/record.url?scp=84957281739&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84957281739&partnerID=8YFLogxK

U2 - 10.1116/1.571986

DO - 10.1116/1.571986

M3 - Article

AN - SCOPUS:84957281739

VL - 1

SP - 717

EP - 718

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 2

ER -