Summary Abstract: Surface-etching kinetics of hydrogen plasma on III-V compound semiconductors

C. W. Tu, R. P.H. Chang, A. R. Schlier

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)
Original languageEnglish
Pages (from-to)637-638
Number of pages2
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume1
Issue number2
DOIs
Publication statusPublished - Apr 1983

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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