Abstract
The surface and bulk chemical compositions of as-deposited and annealed superconducting Tl2Ba2Ca2Cu3Ox thin films have been analyzed by Auger electron spectroscopy (AES). These films are prepared on yttria-stabilized zirconia single-crystal substrates by a combination of metal-organic chemical vapor deposition (MOCVD) and thallium vapor diffusion. BaCaCuO films are first prepared by MOCVD. Thallium is then incorporated into these films by annealing in the presence of a mixture of oxides (Tl2O3, BaO, CaO and CuO) of a specific composition. The as-deposited BaCaCuO films are found to be free of carbon in the interior region. AES depth-profiling experiments reveal consistent atomic homogeneity throughout both the as-deposited BaCaCuO films and the Tl vapor-diffused superconducting films. Apparent intergrowth observed at the substrate-film interface may be due to surface roughness.
| Original language | English |
|---|---|
| Pages (from-to) | 37-40 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 216 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - Aug 28 1992 |
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ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
Cite this
Surface and bulk analysis of metal-organic chemical vapor deposition-derived superconducting Tl2Ba2Ca2Cu3Ox thin films by Auger electron spectroscopy. / Ciliberto, Enrico; Fragalá, Ignazio L.; Malandrino, Graziella; Allen, Geoffrey C.; Younes, Charles M.; Marks, Tobin J; Richeson, Darrin S.; Schulz, Douglas L.
In: Thin Solid Films, Vol. 216, No. 1, 28.08.1992, p. 37-40.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Surface and bulk analysis of metal-organic chemical vapor deposition-derived superconducting Tl2Ba2Ca2Cu3Ox thin films by Auger electron spectroscopy
AU - Ciliberto, Enrico
AU - Fragalá, Ignazio L.
AU - Malandrino, Graziella
AU - Allen, Geoffrey C.
AU - Younes, Charles M.
AU - Marks, Tobin J
AU - Richeson, Darrin S.
AU - Schulz, Douglas L.
PY - 1992/8/28
Y1 - 1992/8/28
N2 - The surface and bulk chemical compositions of as-deposited and annealed superconducting Tl2Ba2Ca2Cu3Ox thin films have been analyzed by Auger electron spectroscopy (AES). These films are prepared on yttria-stabilized zirconia single-crystal substrates by a combination of metal-organic chemical vapor deposition (MOCVD) and thallium vapor diffusion. BaCaCuO films are first prepared by MOCVD. Thallium is then incorporated into these films by annealing in the presence of a mixture of oxides (Tl2O3, BaO, CaO and CuO) of a specific composition. The as-deposited BaCaCuO films are found to be free of carbon in the interior region. AES depth-profiling experiments reveal consistent atomic homogeneity throughout both the as-deposited BaCaCuO films and the Tl vapor-diffused superconducting films. Apparent intergrowth observed at the substrate-film interface may be due to surface roughness.
AB - The surface and bulk chemical compositions of as-deposited and annealed superconducting Tl2Ba2Ca2Cu3Ox thin films have been analyzed by Auger electron spectroscopy (AES). These films are prepared on yttria-stabilized zirconia single-crystal substrates by a combination of metal-organic chemical vapor deposition (MOCVD) and thallium vapor diffusion. BaCaCuO films are first prepared by MOCVD. Thallium is then incorporated into these films by annealing in the presence of a mixture of oxides (Tl2O3, BaO, CaO and CuO) of a specific composition. The as-deposited BaCaCuO films are found to be free of carbon in the interior region. AES depth-profiling experiments reveal consistent atomic homogeneity throughout both the as-deposited BaCaCuO films and the Tl vapor-diffused superconducting films. Apparent intergrowth observed at the substrate-film interface may be due to surface roughness.
UR - http://www.scopus.com/inward/record.url?scp=0345978010&partnerID=8YFLogxK
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U2 - 10.1016/0040-6090(92)90865-9
DO - 10.1016/0040-6090(92)90865-9
M3 - Article
VL - 216
SP - 37
EP - 40
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 1
ER -