Surface damage on diamond membranes fabricated by ion implantation and lift-off

V. S. Drumm, A. D.C. Alves, B. A. Fairchild, K. Ganesan, J. C. McCallum, D. N. Jamieson, S. Prawer, S. Rubanov, R. Kalish, L. C. Feldman

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Abstract

Thin membranes with excellent optical properties are essential elements in diamond based photonic systems. Due to the chemical inertness of diamond, ion beam processing must be employed to carve photonic structures. One method to realize such membranes is ion-implantation graphitization followed by chemical removal of the sacrificial graphite. The interface revealed when the sacrificial layer is removed has interesting properties. To investigate this interface, we employed the surface sensitive technique of grazing angle channeled Rutherford backscattering spectroscopy. Even after high temperature annealing and chemical etching a thin layer of damaged diamond remains, however, it is removed by hydrogen plasma exposure.

Original languageEnglish
Article number231904
JournalApplied Physics Letters
Volume98
Issue number23
DOIs
Publication statusPublished - Jun 6 2011

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Drumm, V. S., Alves, A. D. C., Fairchild, B. A., Ganesan, K., McCallum, J. C., Jamieson, D. N., Prawer, S., Rubanov, S., Kalish, R., & Feldman, L. C. (2011). Surface damage on diamond membranes fabricated by ion implantation and lift-off. Applied Physics Letters, 98(23), [231904]. https://doi.org/10.1063/1.3597223