Synthesis of supported catalysts by atomic layer deposition

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.

Original languageEnglish
Pages (from-to)93-98
Number of pages6
JournalTopics in Catalysis
Volume55
Issue number1-2
DOIs
Publication statusPublished - Mar 2012

Fingerprint

Atomic layer deposition
Catalyst supports
Oxides
Metals
Deposits
Binary sequences
Metal nanoparticles
Chemical vapor deposition
Monolayers
Catalysts

Keywords

  • Atomic layer epitaxy
  • High surface area catalytic materials
  • Oxide and metal atomic layers

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)

Cite this

Synthesis of supported catalysts by atomic layer deposition. / Stair, Peter C.

In: Topics in Catalysis, Vol. 55, No. 1-2, 03.2012, p. 93-98.

Research output: Contribution to journalArticle

@article{e82eda5d3440499887a2753da9242f20,
title = "Synthesis of supported catalysts by atomic layer deposition",
abstract = "A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.",
keywords = "Atomic layer epitaxy, High surface area catalytic materials, Oxide and metal atomic layers",
author = "Stair, {Peter C}",
year = "2012",
month = "3",
doi = "10.1007/s11244-012-9776-4",
language = "English",
volume = "55",
pages = "93--98",
journal = "Topics in Catalysis",
issn = "1022-5528",
publisher = "Springer Netherlands",
number = "1-2",

}

TY - JOUR

T1 - Synthesis of supported catalysts by atomic layer deposition

AU - Stair, Peter C

PY - 2012/3

Y1 - 2012/3

N2 - A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.

AB - A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.

KW - Atomic layer epitaxy

KW - High surface area catalytic materials

KW - Oxide and metal atomic layers

UR - http://www.scopus.com/inward/record.url?scp=84882565863&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84882565863&partnerID=8YFLogxK

U2 - 10.1007/s11244-012-9776-4

DO - 10.1007/s11244-012-9776-4

M3 - Article

VL - 55

SP - 93

EP - 98

JO - Topics in Catalysis

JF - Topics in Catalysis

SN - 1022-5528

IS - 1-2

ER -