A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.
- Atomic layer epitaxy
- High surface area catalytic materials
- Oxide and metal atomic layers
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