The adsorption and decomposition of trimethylamine on the clean and oxidized Mo(100) surface

B. W. Walker, Peter C Stair

Research output: Contribution to journalArticle

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Abstract

The adsorption and decomposition of trimethylamine ((CH3)3N) has been studied by LEED, Auger and thermal desorption spectroscopy on clean and oxygen pretreated Mo(100) surfaces. On the clean surface, trimethylamine initially decomposes into atomic species. After the surface has been partially passivated by these decomposition products, the adsorption of trimethylamine is molecular. Adsorption on a series of oxygen pretreated surfaces was investigated with oxygen concentrations ranging from approximately 0.8 monolayer to MoO2. Adsorption on these surfaces was purely molecular. The molecular adsorbate decomposes on heating to produce H2, N2, CO (on oxidized surfaces only), CH4 and HCN. The adsorption and decomposition of trimethylamine (saturation coverage, products and desorption temperature) is independent of oxygen concentration from the monolayer regime up to MoO2. The rate limiting step in the formation of CH4 and HCN is C-N bond breaking for trimethylamine decomposition. A dramatic reduction in the temperature for N2 desorption due to the presence of adsorbed carbon was also observed.

Original languageEnglish
Pages (from-to)315-337
Number of pages23
JournalSurface Science
Volume103
Issue number2-3
DOIs
Publication statusPublished - Feb 2 1981

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Decomposition
decomposition
Adsorption
adsorption
Oxygen
desorption
oxygen
Monolayers
Desorption
Thermal desorption spectroscopy
Adsorbates
Carbon Monoxide
products
trimethylamine
Carbon
saturation
Heating
Temperature
heating
temperature

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

The adsorption and decomposition of trimethylamine on the clean and oxidized Mo(100) surface. / Walker, B. W.; Stair, Peter C.

In: Surface Science, Vol. 103, No. 2-3, 02.02.1981, p. 315-337.

Research output: Contribution to journalArticle

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abstract = "The adsorption and decomposition of trimethylamine ((CH3)3N) has been studied by LEED, Auger and thermal desorption spectroscopy on clean and oxygen pretreated Mo(100) surfaces. On the clean surface, trimethylamine initially decomposes into atomic species. After the surface has been partially passivated by these decomposition products, the adsorption of trimethylamine is molecular. Adsorption on a series of oxygen pretreated surfaces was investigated with oxygen concentrations ranging from approximately 0.8 monolayer to MoO2. Adsorption on these surfaces was purely molecular. The molecular adsorbate decomposes on heating to produce H2, N2, CO (on oxidized surfaces only), CH4 and HCN. The adsorption and decomposition of trimethylamine (saturation coverage, products and desorption temperature) is independent of oxygen concentration from the monolayer regime up to MoO2. The rate limiting step in the formation of CH4 and HCN is C-N bond breaking for trimethylamine decomposition. A dramatic reduction in the temperature for N2 desorption due to the presence of adsorbed carbon was also observed.",
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N2 - The adsorption and decomposition of trimethylamine ((CH3)3N) has been studied by LEED, Auger and thermal desorption spectroscopy on clean and oxygen pretreated Mo(100) surfaces. On the clean surface, trimethylamine initially decomposes into atomic species. After the surface has been partially passivated by these decomposition products, the adsorption of trimethylamine is molecular. Adsorption on a series of oxygen pretreated surfaces was investigated with oxygen concentrations ranging from approximately 0.8 monolayer to MoO2. Adsorption on these surfaces was purely molecular. The molecular adsorbate decomposes on heating to produce H2, N2, CO (on oxidized surfaces only), CH4 and HCN. The adsorption and decomposition of trimethylamine (saturation coverage, products and desorption temperature) is independent of oxygen concentration from the monolayer regime up to MoO2. The rate limiting step in the formation of CH4 and HCN is C-N bond breaking for trimethylamine decomposition. A dramatic reduction in the temperature for N2 desorption due to the presence of adsorbed carbon was also observed.

AB - The adsorption and decomposition of trimethylamine ((CH3)3N) has been studied by LEED, Auger and thermal desorption spectroscopy on clean and oxygen pretreated Mo(100) surfaces. On the clean surface, trimethylamine initially decomposes into atomic species. After the surface has been partially passivated by these decomposition products, the adsorption of trimethylamine is molecular. Adsorption on a series of oxygen pretreated surfaces was investigated with oxygen concentrations ranging from approximately 0.8 monolayer to MoO2. Adsorption on these surfaces was purely molecular. The molecular adsorbate decomposes on heating to produce H2, N2, CO (on oxidized surfaces only), CH4 and HCN. The adsorption and decomposition of trimethylamine (saturation coverage, products and desorption temperature) is independent of oxygen concentration from the monolayer regime up to MoO2. The rate limiting step in the formation of CH4 and HCN is C-N bond breaking for trimethylamine decomposition. A dramatic reduction in the temperature for N2 desorption due to the presence of adsorbed carbon was also observed.

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