The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials

Shlomo Yitzchaik; Ashok K. Kakkar; Stephen B. Roscoe; Yuji Orihashi; Tobin J. Marks; Weiping Lin; George K. Wong

doi:10.1080/10587259408029710

The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials

Shlomo Yitzchaik, Ashok K. Kakkar, Stephen B. Roscoe, Yuji Orihashi, Tobin J. Marks, Weiping Lin, George K. Wong

Northwestern University

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

Construction on inorganic oxide substrates of covalently self-assembled second-order nonlinear optical (NLO) materials containing a variety of acentrically organized high-Yβ chromophores is investigated as a function of film deposition conditions. Structurally different chromophores exhibit varying packing arrangements on the surface. Changing the medium for the chromophore deposition reaction on functionalized surfaces from a polar solvent to a nonpolar solvent and raising the temperature increases the chromophore number density on the surface and yields improved NLO response. These robust thin film materials show very high second harmonic generation (SHG) efficiencies with for ~ 25 À thick monolayers of up to 7 x 10-7 esu at 1064 nm.

Original language	English
Pages (from-to)	9-16
Number of pages	8
Journal	Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals
Volume	240
Issue number	1
DOIs	https://doi.org/10.1080/10587259408029710
Publication status	Published - Feb 1 1994

ASJC Scopus subject areas

Condensed Matter Physics

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Yitzchaik, S., Kakkar, A. K., Roscoe, S. B., Orihashi, Y., Marks, T. J., Lin, W., & Wong, G. K. (1994). The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials. Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals, 240(1), 9-16. https://doi.org/10.1080/10587259408029710

The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials. / Yitzchaik, Shlomo; Kakkar, Ashok K.; Roscoe, Stephen B.; Orihashi, Yuji; Marks, Tobin J.; Lin, Weiping; Wong, George K.

In: Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals, Vol. 240, No. 1, 01.02.1994, p. 9-16.

Research output: Contribution to journal › Article › peer-review

Yitzchaik, S, Kakkar, AK, Roscoe, SB, Orihashi, Y, Marks, TJ, Lin, W & Wong, GK 1994, 'The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials', Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals, vol. 240, no. 1, pp. 9-16. https://doi.org/10.1080/10587259408029710

Yitzchaik S, Kakkar AK, Roscoe SB, Orihashi Y, Marks TJ, Lin W et al. The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials. Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals. 1994 Feb 1;240(1):9-16. https://doi.org/10.1080/10587259408029710

Yitzchaik, Shlomo ; Kakkar, Ashok K. ; Roscoe, Stephen B. ; Orihashi, Yuji ; Marks, Tobin J. ; Lin, Weiping ; Wong, George K. / The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials. In: Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals. 1994 ; Vol. 240, No. 1. pp. 9-16.

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abstract = "Construction on inorganic oxide substrates of covalently self-assembled second-order nonlinear optical (NLO) materials containing a variety of acentrically organized high-Yβ chromophores is investigated as a function of film deposition conditions. Structurally different chromophores exhibit varying packing arrangements on the surface. Changing the medium for the chromophore deposition reaction on functionalized surfaces from a polar solvent to a nonpolar solvent and raising the temperature increases the chromophore number density on the surface and yields improved NLO response. These robust thin film materials show very high second harmonic generation (SHG) efficiencies with for ~ 25 {\`A} thick monolayers of up to 7 x 10-7 esu at 1064 nm.",

author = "Shlomo Yitzchaik and Kakkar, {Ashok K.} and Roscoe, {Stephen B.} and Yuji Orihashi and Marks, {Tobin J.} and Weiping Lin and Wong, {George K.}",

note = "Funding Information: Materials Research Center of Northwestern University (Grant DMR9120521) and by the Air Force Office of Scientific Research (Contract 90-0071). A.K.K. thanks NSERC of Canada for a post-doctoral fellowship.",

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AU - Orihashi, Yuji

AU - Marks, Tobin J.

AU - Lin, Weiping

AU - Wong, George K.

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AB - Construction on inorganic oxide substrates of covalently self-assembled second-order nonlinear optical (NLO) materials containing a variety of acentrically organized high-Yβ chromophores is investigated as a function of film deposition conditions. Structurally different chromophores exhibit varying packing arrangements on the surface. Changing the medium for the chromophore deposition reaction on functionalized surfaces from a polar solvent to a nonpolar solvent and raising the temperature increases the chromophore number density on the surface and yields improved NLO response. These robust thin film materials show very high second harmonic generation (SHG) efficiencies with for ~ 25 À thick monolayers of up to 7 x 10-7 esu at 1064 nm.

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The effect of chromophore architecture and deposition conditions on the optical and microstructural characteristics of self-assembled chromophoric thin film nlomaterials

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