The influence of lead underpotential deposition on the capacitance of the silver-aqueous interface

Joseph T Hupp, D. Larkin, Michael J. Weaver

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

The differential capacitance of electrodcs formed by the underpotential deposition of lead at a polycrystalline silver substrate in contact with aqueous sodium perchlorate media has been studied in order to assess the influence of the surface atomic layer of the electrode in comparison with that of the underlying bulk metal. A novel method for preparing such surfaces using very dilute lead solutions and a rotating disk electrode was developed whereby the coverage of the resulting lead layers remained constant in situ over a wide potential range for long time periods in quiescent solution. It was found that lead layers on silver having coverages in the vicinity of a monolayer and beyond exhibited double-layer properties that were very similar to those for polycrystalline lead electrodes, and markedly different to those for clean silver. This suggests that the surface atomic layer provides the predominant influence upon the double-layer structure. The virtues of employing underpotential-deposited metal films in exploring the influences of the metal surface upon the interfacial structure are pointed out.

Original languageEnglish
Pages (from-to)299-307
Number of pages9
JournalJournal of Electroanalytical Chemistry
Volume131
Issue numberC
DOIs
Publication statusPublished - Jan 8 1982

Fingerprint

Silver
Capacitance
Lead
Metals
Electrodes
Rotating disks
Monolayers
Sodium
Substrates

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Analytical Chemistry
  • Electrochemistry

Cite this

The influence of lead underpotential deposition on the capacitance of the silver-aqueous interface. / Hupp, Joseph T; Larkin, D.; Weaver, Michael J.

In: Journal of Electroanalytical Chemistry, Vol. 131, No. C, 08.01.1982, p. 299-307.

Research output: Contribution to journalArticle

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