The role played by oxygen plasma on Teflon: Relevance to the concept of "cryptoelectrons"

Silvia Piperno, Hagai Cohen, Tatyana Bendikov, Meir Lahav, Igor Lubomirsky

Research output: Contribution to journalReview article

Abstract

Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu 2+ and Pd 2+ ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu 2+ and Pd 2+. We reaffirm our statement that Cu 2+ and Pd 2+ ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.

Original languageEnglish
Pages (from-to)11185-11186
Number of pages2
JournalPhysical Chemistry Chemical Physics
Volume14
Issue number31
DOIs
Publication statusPublished - Aug 21 2012

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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