The role played by oxygen plasma on Teflon: Relevance to the concept of "cryptoelectrons"

Silvia Piperno, Hagai Cohen, Tatyana Bendikov, Meir Lahav, Igor Lubomirsky

Research output: Contribution to journalArticle

Abstract

Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu 2+ and Pd 2+ ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu 2+ and Pd 2+. We reaffirm our statement that Cu 2+ and Pd 2+ ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.

Original languageEnglish
Pages (from-to)11185-11186
Number of pages2
JournalPhysical Chemistry Chemical Physics
Volume14
Issue number31
DOIs
Publication statusPublished - Aug 21 2012

Fingerprint

teflon (trademark)
oxygen plasma
Polytetrafluoroethylene
Oxygen
Plasmas
Ions
high pressure oxygen
Organic polymers
Polymethyl Methacrylate
cleaning
Cleaning
ions
Adsorption
adsorption
polymers

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Physics and Astronomy(all)

Cite this

The role played by oxygen plasma on Teflon : Relevance to the concept of "cryptoelectrons". / Piperno, Silvia; Cohen, Hagai; Bendikov, Tatyana; Lahav, Meir; Lubomirsky, Igor.

In: Physical Chemistry Chemical Physics, Vol. 14, No. 31, 21.08.2012, p. 11185-11186.

Research output: Contribution to journalArticle

Piperno, Silvia ; Cohen, Hagai ; Bendikov, Tatyana ; Lahav, Meir ; Lubomirsky, Igor. / The role played by oxygen plasma on Teflon : Relevance to the concept of "cryptoelectrons". In: Physical Chemistry Chemical Physics. 2012 ; Vol. 14, No. 31. pp. 11185-11186.
@article{1c8973e5db7d48eb891010f1430aa6e5,
title = "The role played by oxygen plasma on Teflon: Relevance to the concept of {"}cryptoelectrons{"}",
abstract = "Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu 2+ and Pd 2+ ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu 2+ and Pd 2+. We reaffirm our statement that Cu 2+ and Pd 2+ ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.",
author = "Silvia Piperno and Hagai Cohen and Tatyana Bendikov and Meir Lahav and Igor Lubomirsky",
year = "2012",
month = "8",
day = "21",
doi = "10.1039/c2cp41505d",
language = "English",
volume = "14",
pages = "11185--11186",
journal = "Physical Chemistry Chemical Physics",
issn = "1463-9076",
publisher = "Royal Society of Chemistry",
number = "31",

}

TY - JOUR

T1 - The role played by oxygen plasma on Teflon

T2 - Relevance to the concept of "cryptoelectrons"

AU - Piperno, Silvia

AU - Cohen, Hagai

AU - Bendikov, Tatyana

AU - Lahav, Meir

AU - Lubomirsky, Igor

PY - 2012/8/21

Y1 - 2012/8/21

N2 - Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu 2+ and Pd 2+ ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu 2+ and Pd 2+. We reaffirm our statement that Cu 2+ and Pd 2+ ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.

AB - Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu 2+ and Pd 2+ ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu 2+ and Pd 2+. We reaffirm our statement that Cu 2+ and Pd 2+ ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.

UR - http://www.scopus.com/inward/record.url?scp=84864228116&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84864228116&partnerID=8YFLogxK

U2 - 10.1039/c2cp41505d

DO - 10.1039/c2cp41505d

M3 - Article

C2 - 22739684

AN - SCOPUS:84864228116

VL - 14

SP - 11185

EP - 11186

JO - Physical Chemistry Chemical Physics

JF - Physical Chemistry Chemical Physics

SN - 1463-9076

IS - 31

ER -