The structure of tetrahedral amorphous carbon thin films

S. R P Silva, Xu Shi, B. K. Tay, H. S. Tan, H. J. Scheibe, Manish Chhowalla, W. I. Milne

Research output: Contribution to journalArticle

41 Citations (Scopus)

Abstract

Tetrahedral amorphous carbon (ta-C) thin films were deposited using both the filtered cathodic vacuum arc (FCVA) and the pulsed laser arc (PLA) deposition techniques. The FCVA deposited films are analysed as a function of ion energy of the deposition species and substrate temperature. The films deposited using FCVA as a function of temperature are compared with those deposited using the PLA technique. The microscopic structure of the films is examined using electron microscopy. The density, bonding hybridization and chemical composition are obtained by electron energy loss spectroscopy (EELS). The data for the diamond-like sp3 bonding component in the ta-C films clearly show a peak which is predicted by the subplantation models proposed for the growth of amorphous carbon films. The structural modifications observed as a function of temperature can also be explained using the subplantation model. Under certain deposition conditions used in this study, nanocrystallites are observed embedded in the amorphous carbon matrix. The chemical composition of these crystallites is carbon. The microstructure of the deposited crystals is analysed in terms of lattice spacing and is indexed to graphite and cubic diamond.

Original languageEnglish
Pages (from-to)317-322
Number of pages6
JournalThin Solid Films
Volume290-291
DOIs
Publication statusPublished - Dec 15 1996

Fingerprint

Carbon films
Amorphous carbon
arcs
Thin films
Diamond
carbon
Vacuum
Amorphous films
thin films
Pulsed lasers
Diamonds
vacuum
pulsed lasers
chemical composition
Nanocrystallites
diamonds
Graphite
Electron energy loss spectroscopy
Chemical analysis
Crystallites

Keywords

  • Amorphous carbon
  • Electron energy loss spectroscopy (EELS)
  • Tetrahedral amorphous carbon
  • Vacuum arc deposition

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Silva, S. R. P., Shi, X., Tay, B. K., Tan, H. S., Scheibe, H. J., Chhowalla, M., & Milne, W. I. (1996). The structure of tetrahedral amorphous carbon thin films. Thin Solid Films, 290-291, 317-322. https://doi.org/10.1016/S0040-6090(96)09182-1

The structure of tetrahedral amorphous carbon thin films. / Silva, S. R P; Shi, Xu; Tay, B. K.; Tan, H. S.; Scheibe, H. J.; Chhowalla, Manish; Milne, W. I.

In: Thin Solid Films, Vol. 290-291, 15.12.1996, p. 317-322.

Research output: Contribution to journalArticle

Silva, SRP, Shi, X, Tay, BK, Tan, HS, Scheibe, HJ, Chhowalla, M & Milne, WI 1996, 'The structure of tetrahedral amorphous carbon thin films', Thin Solid Films, vol. 290-291, pp. 317-322. https://doi.org/10.1016/S0040-6090(96)09182-1
Silva, S. R P ; Shi, Xu ; Tay, B. K. ; Tan, H. S. ; Scheibe, H. J. ; Chhowalla, Manish ; Milne, W. I. / The structure of tetrahedral amorphous carbon thin films. In: Thin Solid Films. 1996 ; Vol. 290-291. pp. 317-322.
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