Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes

R. G. Lacerda, K. B K Teo, A. S. Teh, M. H. Yang, S. H. Dalal, D. A. Jefferson, J. H. Durrell, N. L. Rupesinghe, D. Roy, G. A J Amaratunga, W. I. Milne, F. Wyczisk, P. Legagneux, Manish Chhowalla

Research output: Contribution to journalArticle

39 Citations (Scopus)

Abstract

A thin-film triple metal catalyst was used for investigating the growth of multiwall and single-wall carbon nanotubes (SWCNT) by chemical-vapor deposition (CVD). A full map of the metals in the sample surface was constructed and their evolution followed at different deposition temperatures by using Nanoauger spectroscopy. The initial iron layer was transformed into nanosized particles at the surface during the formation of SWCNT at high temperatures. During the annealing process, the Al layer played an important role by being altered into Al xO y.

Original languageEnglish
Pages (from-to)4456-4462
Number of pages7
JournalJournal of Applied Physics
Volume96
Issue number8
DOIs
Publication statusPublished - Oct 15 2004

Fingerprint

carbon nanotubes
catalysts
thin films
metals
vapor deposition
iron
annealing
spectroscopy
temperature

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Lacerda, R. G., Teo, K. B. K., Teh, A. S., Yang, M. H., Dalal, S. H., Jefferson, D. A., ... Chhowalla, M. (2004). Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes. Journal of Applied Physics, 96(8), 4456-4462. https://doi.org/10.1063/1.1794359

Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes. / Lacerda, R. G.; Teo, K. B K; Teh, A. S.; Yang, M. H.; Dalal, S. H.; Jefferson, D. A.; Durrell, J. H.; Rupesinghe, N. L.; Roy, D.; Amaratunga, G. A J; Milne, W. I.; Wyczisk, F.; Legagneux, P.; Chhowalla, Manish.

In: Journal of Applied Physics, Vol. 96, No. 8, 15.10.2004, p. 4456-4462.

Research output: Contribution to journalArticle

Lacerda, RG, Teo, KBK, Teh, AS, Yang, MH, Dalal, SH, Jefferson, DA, Durrell, JH, Rupesinghe, NL, Roy, D, Amaratunga, GAJ, Milne, WI, Wyczisk, F, Legagneux, P & Chhowalla, M 2004, 'Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes', Journal of Applied Physics, vol. 96, no. 8, pp. 4456-4462. https://doi.org/10.1063/1.1794359
Lacerda RG, Teo KBK, Teh AS, Yang MH, Dalal SH, Jefferson DA et al. Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes. Journal of Applied Physics. 2004 Oct 15;96(8):4456-4462. https://doi.org/10.1063/1.1794359
Lacerda, R. G. ; Teo, K. B K ; Teh, A. S. ; Yang, M. H. ; Dalal, S. H. ; Jefferson, D. A. ; Durrell, J. H. ; Rupesinghe, N. L. ; Roy, D. ; Amaratunga, G. A J ; Milne, W. I. ; Wyczisk, F. ; Legagneux, P. ; Chhowalla, Manish. / Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes. In: Journal of Applied Physics. 2004 ; Vol. 96, No. 8. pp. 4456-4462.
@article{7841562bb74a45998012320762280438,
title = "Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes",
abstract = "A thin-film triple metal catalyst was used for investigating the growth of multiwall and single-wall carbon nanotubes (SWCNT) by chemical-vapor deposition (CVD). A full map of the metals in the sample surface was constructed and their evolution followed at different deposition temperatures by using Nanoauger spectroscopy. The initial iron layer was transformed into nanosized particles at the surface during the formation of SWCNT at high temperatures. During the annealing process, the Al layer played an important role by being altered into Al xO y.",
author = "Lacerda, {R. G.} and Teo, {K. B K} and Teh, {A. S.} and Yang, {M. H.} and Dalal, {S. H.} and Jefferson, {D. A.} and Durrell, {J. H.} and Rupesinghe, {N. L.} and D. Roy and Amaratunga, {G. A J} and Milne, {W. I.} and F. Wyczisk and P. Legagneux and Manish Chhowalla",
year = "2004",
month = "10",
day = "15",
doi = "10.1063/1.1794359",
language = "English",
volume = "96",
pages = "4456--4462",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "8",

}

TY - JOUR

T1 - Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes

AU - Lacerda, R. G.

AU - Teo, K. B K

AU - Teh, A. S.

AU - Yang, M. H.

AU - Dalal, S. H.

AU - Jefferson, D. A.

AU - Durrell, J. H.

AU - Rupesinghe, N. L.

AU - Roy, D.

AU - Amaratunga, G. A J

AU - Milne, W. I.

AU - Wyczisk, F.

AU - Legagneux, P.

AU - Chhowalla, Manish

PY - 2004/10/15

Y1 - 2004/10/15

N2 - A thin-film triple metal catalyst was used for investigating the growth of multiwall and single-wall carbon nanotubes (SWCNT) by chemical-vapor deposition (CVD). A full map of the metals in the sample surface was constructed and their evolution followed at different deposition temperatures by using Nanoauger spectroscopy. The initial iron layer was transformed into nanosized particles at the surface during the formation of SWCNT at high temperatures. During the annealing process, the Al layer played an important role by being altered into Al xO y.

AB - A thin-film triple metal catalyst was used for investigating the growth of multiwall and single-wall carbon nanotubes (SWCNT) by chemical-vapor deposition (CVD). A full map of the metals in the sample surface was constructed and their evolution followed at different deposition temperatures by using Nanoauger spectroscopy. The initial iron layer was transformed into nanosized particles at the surface during the formation of SWCNT at high temperatures. During the annealing process, the Al layer played an important role by being altered into Al xO y.

UR - http://www.scopus.com/inward/record.url?scp=7544224693&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=7544224693&partnerID=8YFLogxK

U2 - 10.1063/1.1794359

DO - 10.1063/1.1794359

M3 - Article

VL - 96

SP - 4456

EP - 4462

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 8

ER -