Thin films of hard cubic Zr3N4 stabilized by stress

Manish Chhowalla, H. Emrah Unalan

Research output: Contribution to journalArticle

106 Citations (Scopus)

Abstract

The realization and characterization of hard cubic Zr3N 4 (c-Zr3N4) thin films were discussed. The films, deposited using a novel but industrially viable modified filtered cathodic arc (FCA) method, undergo a phase transformation from orthorhombic to cubic above a critical stress level of 9 GPa as determined by X-ray diffraction and Raman spectroscopy. The c-Zr3N4 films were significantly harder (∼36 GPa) than both the orthorhombic Zr 3N4 and ZrN films (∼27 GPa). It was shown that the ability to deposit this material onto components as a thin film is expected to allow its use in wear- and oxidation-resistant applications.

Original languageEnglish
Pages (from-to)317-322
Number of pages6
JournalNature Materials
Volume4
Issue number4
DOIs
Publication statusPublished - Apr 2005

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Thin films
thin films
critical loading
phase transformations
Raman spectroscopy
Deposits
arcs
Phase transitions
deposits
Wear of materials
X ray diffraction
Oxidation
oxidation
diffraction
spectroscopy
x rays

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Thin films of hard cubic Zr3N4 stabilized by stress. / Chhowalla, Manish; Unalan, H. Emrah.

In: Nature Materials, Vol. 4, No. 4, 04.2005, p. 317-322.

Research output: Contribution to journalArticle

Chhowalla, Manish ; Unalan, H. Emrah. / Thin films of hard cubic Zr3N4 stabilized by stress. In: Nature Materials. 2005 ; Vol. 4, No. 4. pp. 317-322.
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