Titanium and reduced titania overlayers on titanium dioxide(110)

J. T. Mayer, U. Diebold, T. E. Madey, Eric Garfunkel

Research output: Contribution to journalArticle

212 Citations (Scopus)

Abstract

The adsorption of titanium on titanium dioxide TiO2(110) has been studied by X-ray photoelectron spectroscopy (XPS) and low energy ion scattering (LEIS). The XPS data for Ti overlayers are interpreted using peak fitting based on experimental standard spectra. 4 Å of Ti deposited at 150 K reacts with the substrate to produce ≈ 12 Å of intermediate oxidation state Ti. Adsorption of neutral metal begins on top of this interface oxide film, but 20 Å of deposited Ti are needed to cover the oxide completely. LEIS data indicate a tendency for clustering of Ti on top of the interface oxide. Ar+ sputtering of stoichiometric TiO2 leads to preferential loss of O from the near surface region. This reduction of the clean, annealed oxide surface by Ar+ ion bombardment starts immediately and does not reach a steady state until 3 × 1017 ions cm-2, at which point the reduced overlayer is 17 Å thick.

Original languageEnglish
Pages (from-to)1-11
Number of pages11
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume73
Issue number1
DOIs
Publication statusPublished - May 31 1995

Fingerprint

Titanium
titanium oxides
Titanium dioxide
Oxides
titanium
ion scattering
Ions
oxides
X ray photoelectron spectroscopy
photoelectron spectroscopy
Scattering
Adsorption
adsorption
Ion bombardment
Oxide films
Sputtering
oxide films
bombardment
ions
tendencies

Keywords

  • Low energy ion scattering
  • TiO(110)
  • Titania
  • Titanium
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Spectroscopy
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Atomic and Molecular Physics, and Optics
  • Radiation
  • Surfaces and Interfaces

Cite this

Titanium and reduced titania overlayers on titanium dioxide(110). / Mayer, J. T.; Diebold, U.; Madey, T. E.; Garfunkel, Eric.

In: Journal of Electron Spectroscopy and Related Phenomena, Vol. 73, No. 1, 31.05.1995, p. 1-11.

Research output: Contribution to journalArticle

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abstract = "The adsorption of titanium on titanium dioxide TiO2(110) has been studied by X-ray photoelectron spectroscopy (XPS) and low energy ion scattering (LEIS). The XPS data for Ti overlayers are interpreted using peak fitting based on experimental standard spectra. 4 {\AA} of Ti deposited at 150 K reacts with the substrate to produce ≈ 12 {\AA} of intermediate oxidation state Ti. Adsorption of neutral metal begins on top of this interface oxide film, but 20 {\AA} of deposited Ti are needed to cover the oxide completely. LEIS data indicate a tendency for clustering of Ti on top of the interface oxide. Ar+ sputtering of stoichiometric TiO2 leads to preferential loss of O from the near surface region. This reduction of the clean, annealed oxide surface by Ar+ ion bombardment starts immediately and does not reach a steady state until 3 × 1017 ions cm-2, at which point the reduced overlayer is 17 {\AA} thick.",
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AU - Mayer, J. T.

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N2 - The adsorption of titanium on titanium dioxide TiO2(110) has been studied by X-ray photoelectron spectroscopy (XPS) and low energy ion scattering (LEIS). The XPS data for Ti overlayers are interpreted using peak fitting based on experimental standard spectra. 4 Å of Ti deposited at 150 K reacts with the substrate to produce ≈ 12 Å of intermediate oxidation state Ti. Adsorption of neutral metal begins on top of this interface oxide film, but 20 Å of deposited Ti are needed to cover the oxide completely. LEIS data indicate a tendency for clustering of Ti on top of the interface oxide. Ar+ sputtering of stoichiometric TiO2 leads to preferential loss of O from the near surface region. This reduction of the clean, annealed oxide surface by Ar+ ion bombardment starts immediately and does not reach a steady state until 3 × 1017 ions cm-2, at which point the reduced overlayer is 17 Å thick.

AB - The adsorption of titanium on titanium dioxide TiO2(110) has been studied by X-ray photoelectron spectroscopy (XPS) and low energy ion scattering (LEIS). The XPS data for Ti overlayers are interpreted using peak fitting based on experimental standard spectra. 4 Å of Ti deposited at 150 K reacts with the substrate to produce ≈ 12 Å of intermediate oxidation state Ti. Adsorption of neutral metal begins on top of this interface oxide film, but 20 Å of deposited Ti are needed to cover the oxide completely. LEIS data indicate a tendency for clustering of Ti on top of the interface oxide. Ar+ sputtering of stoichiometric TiO2 leads to preferential loss of O from the near surface region. This reduction of the clean, annealed oxide surface by Ar+ ion bombardment starts immediately and does not reach a steady state until 3 × 1017 ions cm-2, at which point the reduced overlayer is 17 Å thick.

KW - Low energy ion scattering

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