Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

J. R. Babcock, A. Wang, A. W. Metz, N. L. Edleman, M. V. Metz, M. A. Lane, C. R. Kannewurf, Tobin J Marks

Research output: Contribution to journalArticle

Abstract

The transparent conducting CdO thin film growth was studied using a highly volatile, thermally and air-stable cadmium precursor. The example of Cd-containing film growth was presented using metal-organic chemical vapour deposition (MOCVD) using a coordination complex as the precursor. The charge transport properties were compared and favourable results were obtained with the highest conductivities for CdO thin films grown by magnetron sputtering.

Original languageEnglish
Pages (from-to)239-242
Number of pages4
JournalAdvanced Materials
Volume13
Issue number21
Publication statusPublished - Nov 2 2001

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ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Babcock, J. R., Wang, A., Metz, A. W., Edleman, N. L., Metz, M. V., Lane, M. A., Kannewurf, C. R., & Marks, T. J. (2001). Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. Advanced Materials, 13(21), 239-242.