Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Jason R. Babcock; Anchuan Wang; Andrew W. Metz; Nikki L. Edleman; Matthew V. Metz; Melissa A. Lane; Carl R. Kannewurf; Tobin J Marks

doi:10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Jason R. Babcock, Anchuan Wang, Andrew W. Metz, Nikki L. Edleman, Matthew V. Metz, Melissa A. Lane, Carl R. Kannewurf, Tobin J Marks

Northwestern University

Research output: Contribution to journal › Article

25 Citations (Scopus)

Original language	English
Pages (from-to)	239-242
Number of pages	4
Journal	Chemical Vapor Deposition
Volume	7
Issue number	6
DOIs	https://doi.org/10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M
Publication status	Published - Nov 2001

ASJC Scopus subject areas

Process Chemistry and Technology
Electrochemistry
Electronic, Optical and Magnetic Materials
Surfaces, Coatings and Films
Condensed Matter Physics
Surfaces and Interfaces

Cite this

Babcock, J. R., Wang, A., Metz, A. W., Edleman, N. L., Metz, M. V., Lane, M. A., Kannewurf, C. R., & Marks, T. J. (2001). Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. Chemical Vapor Deposition, 7(6), 239-242. https://doi.org/10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. / Babcock, Jason R.; Wang, Anchuan; Metz, Andrew W.; Edleman, Nikki L.; Metz, Matthew V.; Lane, Melissa A.; Kannewurf, Carl R.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 7, No. 6, 11.2001, p. 239-242.

Research output: Contribution to journal › Article

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Access to Document

10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M