Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Jason R. Babcock, Anchuan Wang, Andrew W. Metz, Nikki L. Edleman, Matthew V. Metz, Melissa A. Lane, Carl R. Kannewurf, Tobin J Marks

Research output: Contribution to journal › Article

25 Citations (Scopus)
Original languageEnglish
Pages (from-to)239-242
Number of pages4
JournalChemical Vapor Deposition
Volume7
Issue number6
DOIs
Publication statusPublished - Nov 2001

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Film growth
Cadmium
Thin films
Air

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. / Babcock, Jason R.; Wang, Anchuan; Metz, Andrew W.; Edleman, Nikki L.; Metz, Matthew V.; Lane, Melissa A.; Kannewurf, Carl R.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 7, No. 6, 11.2001, p. 239-242.

Research output: Contribution to journal › Article

Babcock, JR, Wang, A, Metz, AW, Edleman, NL, Metz, MV, Lane, MA, Kannewurf, CR & Marks, TJ 2001, 'Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor', Chemical Vapor Deposition, vol. 7, no. 6, pp. 239-242. https://doi.org/10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M
Babcock JR, Wang A, Metz AW, Edleman NL, Metz MV, Lane MA et al. Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. Chemical Vapor Deposition. 2001 Nov;7(6):239-242. https://doi.org/10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M
Babcock, Jason R. ; Wang, Anchuan ; Metz, Andrew W. ; Edleman, Nikki L. ; Metz, Matthew V. ; Lane, Melissa A. ; Kannewurf, Carl R. ; Marks, Tobin J. / Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. In: Chemical Vapor Deposition. 2001 ; Vol. 7, No. 6. pp. 239-242.
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