Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Jason R. Babcock; Anchuan Wang; Andrew W. Metz; Nikki L. Edleman; Matthew V. Metz; Melissa A. Lane; Carl R. Kannewurf; Tobin J Marks

doi:10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Jason R. Babcock, Anchuan Wang, Andrew W. Metz, Nikki L. Edleman, Matthew V. Metz, Melissa A. Lane, Carl R. Kannewurf, Tobin J Marks

Northwestern University

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Original language	English
Pages (from-to)	239-242
Number of pages	4
Journal	Chemical Vapor Deposition
Volume	7
Issue number	6
DOIs	https://doi.org/10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M
Publication status	Published - Nov 2001

ASJC Scopus subject areas

Process Chemistry and Technology
Electrochemistry
Electronic, Optical and Magnetic Materials
Surfaces, Coatings and Films
Condensed Matter Physics
Surfaces and Interfaces

Access to Document

10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

Cite this

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. / Babcock, Jason R.; Wang, Anchuan; Metz, Andrew W.; Edleman, Nikki L.; Metz, Matthew V.; Lane, Melissa A.; Kannewurf, Carl R.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 7, No. 6, 11.2001, p. 239-242.

Research output: Contribution to journal › Article › peer-review

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