Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Jason R. Babcock; Anchuan Wang; Andrew W. Metz; Nikki L. Edleman; Matthew V. Metz; Melissa A. Lane; Carl R. Kannewurf; Tobin J Marks

doi:10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

Jason R. Babcock, Anchuan Wang, Andrew W. Metz, Nikki L. Edleman, Matthew V. Metz, Melissa A. Lane, Carl R. Kannewurf, Tobin J Marks

Northwestern University

Research output: Contribution to journal › Article

25 Citations (Scopus)

Original language	English
Pages (from-to)	239-242
Number of pages	4
Journal	Chemical Vapor Deposition
Volume	7
Issue number	6
DOIs	https://doi.org/10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M
Publication status	Published - Nov 2001

ASJC Scopus subject areas

Process Chemistry and Technology
Electrochemistry
Electronic, Optical and Magnetic Materials
Surfaces, Coatings and Films
Condensed Matter Physics
Surfaces and Interfaces

Access to Document

10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

Cite this

Babcock, J. R., Wang, A., Metz, A. W., Edleman, N. L., Metz, M. V., Lane, M. A., Kannewurf, C. R., & Marks, T. J. (2001). Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. Chemical Vapor Deposition, 7(6), 239-242. https://doi.org/10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. / Babcock, Jason R.; Wang, Anchuan; Metz, Andrew W.; Edleman, Nikki L.; Metz, Matthew V.; Lane, Melissa A.; Kannewurf, Carl R.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 7, No. 6, 11.2001, p. 239-242.

Research output: Contribution to journal › Article

@article{0899f1157cea4e0f8fe38886ac41f1f6,

title = "Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor",

author = "Babcock, {Jason R.} and Anchuan Wang and Metz, {Andrew W.} and Edleman, {Nikki L.} and Metz, {Matthew V.} and Lane, {Melissa A.} and Kannewurf, {Carl R.} and Marks, {Tobin J}",

year = "2001",

month = nov,

doi = "10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M",

language = "English",

volume = "7",

pages = "239--242",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "6",

}

TY - JOUR

T1 - Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor

AU - Babcock, Jason R.

AU - Wang, Anchuan

AU - Metz, Andrew W.

AU - Edleman, Nikki L.

AU - Metz, Matthew V.

AU - Lane, Melissa A.

AU - Kannewurf, Carl R.

AU - Marks, Tobin J

PY - 2001/11

Y1 - 2001/11

UR - http://www.scopus.com/inward/record.url?scp=0012021956&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0012021956&partnerID=8YFLogxK

U2 - 10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

DO - 10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M

M3 - Article

AN - SCOPUS:0012021956

VL - 7

SP - 239

EP - 242

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

SN - 0948-1907

IS - 6

ER -