Original language | English |
---|---|
Pages (from-to) | 239-242 |
Number of pages | 4 |
Journal | Chemical Vapor Deposition |
Volume | 7 |
Issue number | 6 |
DOIs | |
Publication status | Published - Nov 2001 |
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ASJC Scopus subject areas
- Process Chemistry and Technology
- Electrochemistry
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
Cite this
Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor. / Babcock, Jason R.; Wang, Anchuan; Metz, Andrew W.; Edleman, Nikki L.; Metz, Matthew V.; Lane, Melissa A.; Kannewurf, Carl R.; Marks, Tobin J.
In: Chemical Vapor Deposition, Vol. 7, No. 6, 11.2001, p. 239-242.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Transparent conducting CdO thin film growth using a highly volatile, thermally and air-stable cadmium precursor
AU - Babcock, Jason R.
AU - Wang, Anchuan
AU - Metz, Andrew W.
AU - Edleman, Nikki L.
AU - Metz, Matthew V.
AU - Lane, Melissa A.
AU - Kannewurf, Carl R.
AU - Marks, Tobin J
PY - 2001/11
Y1 - 2001/11
UR - http://www.scopus.com/inward/record.url?scp=0012021956&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0012021956&partnerID=8YFLogxK
U2 - 10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M
DO - 10.1002/1521-3862(200111)7:6<239::AID-CVDE239>3.0.CO;2-M
M3 - Article
AN - SCOPUS:0012021956
VL - 7
SP - 239
EP - 242
JO - Chemical Vapor Deposition
JF - Chemical Vapor Deposition
SN - 0948-1907
IS - 6
ER -