Transparent conducting oxides at high aspect ratios by ALD

M. J. Pellin, J. W. Elam, J. A. Libera, A. B F Martinson, Joseph T Hupp

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Transparent conducting oxides (TCOs) are important electronic materials which as their name implies possess the seemingly mutually exclusive properties of high optical transmittance in the visible region (>80%) and relatively high conductivity. These properties are achieved with high carrier mobilities in relatively wide band gap n-type semiconductor materials. TCOs are sensitive to composition and oxygen stoichiometry. Atomic Layer Deposition (ALD) is an ideal deposition method, particularly when high aspect ratio materials must being coated. Here we use exposure times to control the deposition area. Very long exposure times are used to coat high aspect ratio pores uniformly while short exposure times are used to produce pore closing outer surface films. copyright The Electrochemical Society.

Original languageEnglish
Title of host publicationECS Transactions
Pages243-247
Number of pages5
Volume3
Edition15
DOIs
Publication statusPublished - 2007
Event2nd Symposium on Atomic Layer Deposition Applications - 210th ECS Meeting - Cancun, Mexico
Duration: Oct 29 2006Nov 1 2006

Other

Other2nd Symposium on Atomic Layer Deposition Applications - 210th ECS Meeting
CountryMexico
CityCancun
Period10/29/0611/1/06

Fingerprint

Atomic layer deposition
Aspect ratio
Oxides
Carrier mobility
Opacity
Stoichiometry
Energy gap
Semiconductor materials
Oxygen
Chemical analysis

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Pellin, M. J., Elam, J. W., Libera, J. A., Martinson, A. B. F., & Hupp, J. T. (2007). Transparent conducting oxides at high aspect ratios by ALD. In ECS Transactions (15 ed., Vol. 3, pp. 243-247) https://doi.org/10.1149/1.2721493

Transparent conducting oxides at high aspect ratios by ALD. / Pellin, M. J.; Elam, J. W.; Libera, J. A.; Martinson, A. B F; Hupp, Joseph T.

ECS Transactions. Vol. 3 15. ed. 2007. p. 243-247.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Pellin, MJ, Elam, JW, Libera, JA, Martinson, ABF & Hupp, JT 2007, Transparent conducting oxides at high aspect ratios by ALD. in ECS Transactions. 15 edn, vol. 3, pp. 243-247, 2nd Symposium on Atomic Layer Deposition Applications - 210th ECS Meeting, Cancun, Mexico, 10/29/06. https://doi.org/10.1149/1.2721493
Pellin MJ, Elam JW, Libera JA, Martinson ABF, Hupp JT. Transparent conducting oxides at high aspect ratios by ALD. In ECS Transactions. 15 ed. Vol. 3. 2007. p. 243-247 https://doi.org/10.1149/1.2721493
Pellin, M. J. ; Elam, J. W. ; Libera, J. A. ; Martinson, A. B F ; Hupp, Joseph T. / Transparent conducting oxides at high aspect ratios by ALD. ECS Transactions. Vol. 3 15. ed. 2007. pp. 243-247
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