Transparent conducting oxides at high aspect ratios by ALD

M. J. Pellin, J. W. Elam, J. A. Libera, A. B.F. Martinson, J. T. Hupp

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Transparent conducting oxides (TCOs) are important electronic materials which as their name implies possess the seemingly mutually exclusive properties of high optical transmittance in the visible region (>80%) and relatively high conductivity. These properties are achieved with high carrier mobilities in relatively wide band gap n-type semiconductor materials. TCOs are sensitive to composition and oxygen stoichiometry. Atomic Layer Deposition (ALD) is an ideal deposition method, particularly when high aspect ratio materials must being coated. Here we use exposure times to control the deposition area. Very long exposure times are used to coat high aspect ratio pores uniformly while short exposure times are used to produce pore closing outer surface films. copyright The Electrochemical Society.

Original languageEnglish
Title of host publicationECS Transactions - 2nd Symposium on Atomic Layer Deposition Applications
Pages243-247
Number of pages5
Edition15
DOIs
Publication statusPublished - Dec 1 2007
Event2nd Symposium on Atomic Layer Deposition Applications - 210th ECS Meeting - Cancun, Mexico
Duration: Oct 29 2006Nov 1 2006

Publication series

NameECS Transactions
Number15
Volume3
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other2nd Symposium on Atomic Layer Deposition Applications - 210th ECS Meeting
CountryMexico
CityCancun
Period10/29/0611/1/06

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'Transparent conducting oxides at high aspect ratios by ALD'. Together they form a unique fingerprint.

  • Cite this

    Pellin, M. J., Elam, J. W., Libera, J. A., Martinson, A. B. F., & Hupp, J. T. (2007). Transparent conducting oxides at high aspect ratios by ALD. In ECS Transactions - 2nd Symposium on Atomic Layer Deposition Applications (15 ed., pp. 243-247). (ECS Transactions; Vol. 3, No. 15). https://doi.org/10.1149/1.2721493