Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering

Z. G. Yin, H. T. Zhang, D. M. Goodner, M. J. Bedzyk, Robert P. H. Chang, Y. Sun, J. B. Ketterson

Research output: Contribution to journalArticle

40 Citations (Scopus)

Abstract

We present results on the in situ, two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied as a function of deposition time and the dc power applied to the guns. Control of the latter leads to either continuous or island-/rodlike film morphologies.

Original languageEnglish
Article number061901
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume86
Issue number6
DOIs
Publication statusPublished - Feb 7 2005

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magnetron sputtering
argon-oxygen atmospheres
thin films
coalescing

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Yin, Z. G., Zhang, H. T., Goodner, D. M., Bedzyk, M. J., Chang, R. P. H., Sun, Y., & Ketterson, J. B. (2005). Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering. Applied Physics Letters, 86(6), 1-3. [061901]. https://doi.org/10.1063/1.1861117

Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering. / Yin, Z. G.; Zhang, H. T.; Goodner, D. M.; Bedzyk, M. J.; Chang, Robert P. H.; Sun, Y.; Ketterson, J. B.

In: Applied Physics Letters, Vol. 86, No. 6, 061901, 07.02.2005, p. 1-3.

Research output: Contribution to journalArticle

Yin, ZG, Zhang, HT, Goodner, DM, Bedzyk, MJ, Chang, RPH, Sun, Y & Ketterson, JB 2005, 'Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering', Applied Physics Letters, vol. 86, no. 6, 061901, pp. 1-3. https://doi.org/10.1063/1.1861117
Yin, Z. G. ; Zhang, H. T. ; Goodner, D. M. ; Bedzyk, M. J. ; Chang, Robert P. H. ; Sun, Y. ; Ketterson, J. B. / Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering. In: Applied Physics Letters. 2005 ; Vol. 86, No. 6. pp. 1-3.
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