Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering

Z. G. Yin, H. T. Zhang, D. M. Goodner, M. J. Bedzyk, R. P.H. Chang, Y. Sun, J. B. Ketterson

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Abstract

We present results on the in situ, two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied as a function of deposition time and the dc power applied to the guns. Control of the latter leads to either continuous or island-/rodlike film morphologies.

Original languageEnglish
Article number061901
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume86
Issue number6
DOIs
Publication statusPublished - Feb 7 2005

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Yin, Z. G., Zhang, H. T., Goodner, D. M., Bedzyk, M. J., Chang, R. P. H., Sun, Y., & Ketterson, J. B. (2005). Two-dimensional growth of continuous Cu2 O thin films by magnetron sputtering. Applied Physics Letters, 86(6), 1-3. [061901]. https://doi.org/10.1063/1.1861117