Ultraviolet photonic crystal laser

X. Wu, A. Yamilov, X. Liu, S. Li, V. P. Dravid, R. P.H. Chang, H. Cao

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We fabricated two-dimensional photonic crystal structures in zinc oxide films with focused-ion-beam etching. Lasing is realized in the near-ultraviolet frequency at room temperature under optical pumping. From the measurement of lasing frequency and spatial profile of the lasing modes, as well as the photonic band structure calculation, we conclude that lasing occurs in the strongly localized defect modes near the edges of photonic band gap. These defect modes originate from the structure disorder unintentionally introduced during the fabrication process.

Original languageEnglish
Pages (from-to)3657-3659
Number of pages3
JournalApplied Physics Letters
Issue number17
Publication statusPublished - Oct 25 2004


ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Wu, X., Yamilov, A., Liu, X., Li, S., Dravid, V. P., Chang, R. P. H., & Cao, H. (2004). Ultraviolet photonic crystal laser. Applied Physics Letters, 85(17), 3657-3659. https://doi.org/10.1063/1.1808888