Unsaturated organic monolayers on silicon: Surface passivation and reactivity

Katherine E. Plass, Bruce B. Brunschwig, Nathan S. Lewis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Silicon nanostructures are promising materials for inclusion into inexpensive, yet efficient, solar cells. Surface passivation becomes increasingly important in such structures, and these designs may require chemical linking of silicon interfaces. To address these concerns, a means of passivating silicon surfaces using small, unsaturated organic moieties has been developed and applied to model silicon (111) surfaces. These monolayers protect the surface from oxidation while eliminating interfacial trap states that induce the recombination of photo-induced charge carriers. In addition, these organic groups can undergo secondary reactions, allowing chemical elaboration of the surface while maintaining a passivating underlayer. Here we discuss the passivating properties of unsaturated groups bound to the silicon surface, including vinyl and allyl groups, and we explore their use in metal-catalyzed coupling reactions commonly employed with solution-phase olefins.

Original languageEnglish
Title of host publication234th ACS National Meeting, Abstracts of Scientific Papers
Publication statusPublished - Dec 31 2007
Event234th ACS National Meeting - Boston, MA, United States
Duration: Aug 19 2007Aug 23 2007

Publication series

NameACS National Meeting Book of Abstracts
ISSN (Print)0065-7727

Other

Other234th ACS National Meeting
CountryUnited States
CityBoston, MA
Period8/19/078/23/07

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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