Vanadium, niobium and tantalum by XPS

Pakpoom Buabthong, Natalie Becerra Stasiewicz, Slobodan Mitrovic, Nathan S Lewis

Research output: Contribution to journal › Article

Abstract

We present high-resolution XPS spectra of elemental vanadium, niobium and tantalum sputter-cleaned by Ar+ ions. The energy scales are shown without applying any corrections, and the position of the Fermi level was verified to be at zero binding energy within better than 0.1 eV, as determined from the Fermi edge measurement.

Original languageEnglish
Article number024001
JournalSurface Science Spectra
Volume24
Issue number2
DOIs
Publication statusPublished - Dec 1 2017

Fingerprint

Niobium
Tantalum
Vanadium
tantalum
Fermi level
Binding energy
niobium
vanadium
X ray photoelectron spectroscopy
binding energy
Ions
high resolution
ions
energy

Keywords

  • niobium
  • tantalum
  • vanadium
  • XPS

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Buabthong, P., Becerra Stasiewicz, N., Mitrovic, S., & Lewis, N. S. (2017). Vanadium, niobium and tantalum by XPS. Surface Science Spectra, 24(2), [024001]. https://doi.org/10.1116/1.4998018

Vanadium, niobium and tantalum by XPS. / Buabthong, Pakpoom; Becerra Stasiewicz, Natalie; Mitrovic, Slobodan; Lewis, Nathan S.

In: Surface Science Spectra, Vol. 24, No. 2, 024001, 01.12.2017.

Research output: Contribution to journal › Article

Buabthong, P, Becerra Stasiewicz, N, Mitrovic, S & Lewis, NS 2017, 'Vanadium, niobium and tantalum by XPS', Surface Science Spectra, vol. 24, no. 2, 024001. https://doi.org/10.1116/1.4998018
Buabthong P, Becerra Stasiewicz N, Mitrovic S, Lewis NS. Vanadium, niobium and tantalum by XPS. Surface Science Spectra. 2017 Dec 1;24(2). 024001. https://doi.org/10.1116/1.4998018
Buabthong, Pakpoom ; Becerra Stasiewicz, Natalie ; Mitrovic, Slobodan ; Lewis, Nathan S. / Vanadium, niobium and tantalum by XPS. In: Surface Science Spectra. 2017 ; Vol. 24, No. 2.
@article{58562ee710674d18817a7aca45672fc0,
title = "Vanadium, niobium and tantalum by XPS",
abstract = "We present high-resolution XPS spectra of elemental vanadium, niobium and tantalum sputter-cleaned by Ar+ ions. The energy scales are shown without applying any corrections, and the position of the Fermi level was verified to be at zero binding energy within better than 0.1 eV, as determined from the Fermi edge measurement.",
keywords = "niobium, tantalum, vanadium, XPS",
author = "Pakpoom Buabthong and {Becerra Stasiewicz}, Natalie and Slobodan Mitrovic and Lewis, {Nathan S}",
year = "2017",
month = "12",
day = "1",
doi = "10.1116/1.4998018",
language = "English",
volume = "24",
journal = "Surface Science Spectra",
issn = "1055-5269",
publisher = "AVS Science and Technology Society",
number = "2",

}

TY - JOUR

T1 - Vanadium, niobium and tantalum by XPS

AU - Buabthong, Pakpoom

AU - Becerra Stasiewicz, Natalie

AU - Mitrovic, Slobodan

AU - Lewis, Nathan S

PY - 2017/12/1

Y1 - 2017/12/1

N2 - We present high-resolution XPS spectra of elemental vanadium, niobium and tantalum sputter-cleaned by Ar+ ions. The energy scales are shown without applying any corrections, and the position of the Fermi level was verified to be at zero binding energy within better than 0.1 eV, as determined from the Fermi edge measurement.

AB - We present high-resolution XPS spectra of elemental vanadium, niobium and tantalum sputter-cleaned by Ar+ ions. The energy scales are shown without applying any corrections, and the position of the Fermi level was verified to be at zero binding energy within better than 0.1 eV, as determined from the Fermi edge measurement.

KW - niobium

KW - tantalum

KW - vanadium

KW - XPS

UR - http://www.scopus.com/inward/record.url?scp=85028062669&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85028062669&partnerID=8YFLogxK

U2 - 10.1116/1.4998018

DO - 10.1116/1.4998018

M3 - Article

AN - SCOPUS:85028062669

VL - 24

JO - Surface Science Spectra

JF - Surface Science Spectra

SN - 1055-5269

IS - 2

M1 - 024001

ER -

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