Vapor-phase metalation by atomic layer deposition in a metal-organic framework

Joseph E. Mondloch, Wojciech Bury, David Fairen-Jimenez, Stephanie Kwon, Erica J. Demarco, Mitchell H. Weston, Amy A. Sarjeant, Sonbinh T. Nguyen, Peter C. Stair, Randall Q. Snurr, Omar K. Farha, Joseph T. Hupp

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Abstract

Metal-organic frameworks (MOFs) have received attention for a myriad of potential applications including catalysis, gas storage, and gas separation. Coordinatively unsaturated metal ions often enable key functional behavior of these materials. Most commonly, MOFs have been metalated from the condensed phase (i.e., from solution). Here we introduce a new synthetic strategy capable of metallating MOFs from the gas phase: atomic layer deposition (ALD). Key to enabling metalation by ALD In MOFs (AIM) was the synthesis of NU-1000, a new, thermally stable, Zr-based MOF with spatially oriented -OH groups and large 1D mesopores and apertures.

Original languageEnglish
Pages (from-to)10294-10297
Number of pages4
JournalJournal of the American Chemical Society
Volume135
Issue number28
DOIs
Publication statusPublished - Jul 17 2013

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ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

Cite this

Mondloch, J. E., Bury, W., Fairen-Jimenez, D., Kwon, S., Demarco, E. J., Weston, M. H., Sarjeant, A. A., Nguyen, S. T., Stair, P. C., Snurr, R. Q., Farha, O. K., & Hupp, J. T. (2013). Vapor-phase metalation by atomic layer deposition in a metal-organic framework. Journal of the American Chemical Society, 135(28), 10294-10297. https://doi.org/10.1021/ja4050828