Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films

N. L. Edleman, J. A. Belot, J. R. Babcock, A. W. Metz, M. V. Metz, C. L. Stern, Tobin J Marks

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsD.S. Ginley, J.D. Perkins, H. Kawazoe, D.M. Newns, A.B. Kozyrev
Pages371-376
Number of pages6
Volume623
Publication statusPublished - 2000
EventMaterials Science of Novel Oxide-Based Electronics - San Francisco, CA, United States
Duration: Apr 24 2000Apr 27 2000

Other

OtherMaterials Science of Novel Oxide-Based Electronics
CountryUnited States
CitySan Francisco, CA
Period4/24/004/27/00

Fingerprint

Organic Chemicals
Lanthanoid Series Elements
Fluorine
Organic chemicals
Rare earth elements
Oxide films
Chemical vapor deposition
Metals
Thin films
Materials science
Melting

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Edleman, N. L., Belot, J. A., Babcock, J. R., Metz, A. W., Metz, M. V., Stern, C. L., & Marks, T. J. (2000). Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films. In D. S. Ginley, J. D. Perkins, H. Kawazoe, D. M. Newns, & A. B. Kozyrev (Eds.), Materials Research Society Symposium - Proceedings (Vol. 623, pp. 371-376)

Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films. / Edleman, N. L.; Belot, J. A.; Babcock, J. R.; Metz, A. W.; Metz, M. V.; Stern, C. L.; Marks, Tobin J.

Materials Research Society Symposium - Proceedings. ed. / D.S. Ginley; J.D. Perkins; H. Kawazoe; D.M. Newns; A.B. Kozyrev. Vol. 623 2000. p. 371-376.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Edleman, NL, Belot, JA, Babcock, JR, Metz, AW, Metz, MV, Stern, CL & Marks, TJ 2000, Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films. in DS Ginley, JD Perkins, H Kawazoe, DM Newns & AB Kozyrev (eds), Materials Research Society Symposium - Proceedings. vol. 623, pp. 371-376, Materials Science of Novel Oxide-Based Electronics, San Francisco, CA, United States, 4/24/00.
Edleman NL, Belot JA, Babcock JR, Metz AW, Metz MV, Stern CL et al. Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films. In Ginley DS, Perkins JD, Kawazoe H, Newns DM, Kozyrev AB, editors, Materials Research Society Symposium - Proceedings. Vol. 623. 2000. p. 371-376
Edleman, N. L. ; Belot, J. A. ; Babcock, J. R. ; Metz, A. W. ; Metz, M. V. ; Stern, C. L. ; Marks, Tobin J. / Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films. Materials Research Society Symposium - Proceedings. editor / D.S. Ginley ; J.D. Perkins ; H. Kawazoe ; D.M. Newns ; A.B. Kozyrev. Vol. 623 2000. pp. 371-376
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