Volatile, fluorine-free β-ketoiminate precursors for MOCVD growth of lanthanide oxide thin films

N. L. Edleman, J. A. Belot, J. R. Babcock, A. W. Metz, M. V. Metz, C. L. Stern, T. J. Marks

Research output: Contribution to journalConference article

2 Citations (Scopus)

Abstract

Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.

Original languageEnglish
Pages (from-to)371-376
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume623
DOIs
Publication statusPublished - Jan 1 2000
EventMaterials Science of Novel Oxide-Based Electronics - San Francisco, CA, United States
Duration: Apr 24 2000Apr 27 2000

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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