X-ray nanoscale profiling of layer-by-layer assembled metal/organophosphonate films

Joseph A. Libera, Richard W. Gurney, SonBinh T. Nguyen, Joseph T Hupp, Chian Liu, Ray Conley, Michael J. Bedzyk

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The nanoscale structure of multilayer metal/phosphonate thin films prepared via a layer-by-layer assembly process was studied using specular X-ray reflectivity (XRR), X-ray fluorescence (XRF), and long-period X-ray standing wave (XSW) analysis. After the SiO 2 X-ray mirror surfaces were functionalized with a monolayer film terminated with phosphonate groups, the organic multilayer films were assembled by alternating immersions in (a) aqueous solutions containing Zr 4+, Hf 4+, or Y 3+ cations and then (b) organic solvent solutions of PO 3-R-PO 3, where R was a porphyrin or porphyrin-square spacer molecule. The different heavy metal cations provided X-ray fluorescence marker layers at different heights within the different multilayer assemblies. The XSW measurements used a 22 nm period Si/Mo multilayer mirror. The long-period XSW generated by the zeroth-order (total external reflection) through fourth-order Bragg diffraction conditions made it possible to examine the Fourier transforms of the fluorescent atom distributions over a much larger q z range in reciprocal space than previously achieved.

Original languageEnglish
Pages (from-to)8022-8029
Number of pages8
JournalLangmuir
Volume20
Issue number19
DOIs
Publication statusPublished - Sep 14 2004

Fingerprint

Organophosphonates
metal films
Metals
X rays
standing waves
x rays
Multilayers
Porphyrins
porphyrins
Cations
Mirrors
Positive ions
Fluorescence
mirrors
cations
fluorescence
Multilayer films
heavy metals
Heavy Metals
markers

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

Libera, J. A., Gurney, R. W., Nguyen, S. T., Hupp, J. T., Liu, C., Conley, R., & Bedzyk, M. J. (2004). X-ray nanoscale profiling of layer-by-layer assembled metal/organophosphonate films. Langmuir, 20(19), 8022-8029. https://doi.org/10.1021/la048904b

X-ray nanoscale profiling of layer-by-layer assembled metal/organophosphonate films. / Libera, Joseph A.; Gurney, Richard W.; Nguyen, SonBinh T.; Hupp, Joseph T; Liu, Chian; Conley, Ray; Bedzyk, Michael J.

In: Langmuir, Vol. 20, No. 19, 14.09.2004, p. 8022-8029.

Research output: Contribution to journalArticle

Libera, JA, Gurney, RW, Nguyen, ST, Hupp, JT, Liu, C, Conley, R & Bedzyk, MJ 2004, 'X-ray nanoscale profiling of layer-by-layer assembled metal/organophosphonate films', Langmuir, vol. 20, no. 19, pp. 8022-8029. https://doi.org/10.1021/la048904b
Libera JA, Gurney RW, Nguyen ST, Hupp JT, Liu C, Conley R et al. X-ray nanoscale profiling of layer-by-layer assembled metal/organophosphonate films. Langmuir. 2004 Sep 14;20(19):8022-8029. https://doi.org/10.1021/la048904b
Libera, Joseph A. ; Gurney, Richard W. ; Nguyen, SonBinh T. ; Hupp, Joseph T ; Liu, Chian ; Conley, Ray ; Bedzyk, Michael J. / X-ray nanoscale profiling of layer-by-layer assembled metal/organophosphonate films. In: Langmuir. 2004 ; Vol. 20, No. 19. pp. 8022-8029.
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