X-RAY PHOTOELECTRON SPECTROSCOPY ANALYSIS OF POTASSIUM ADSORPTION ONTO nu -SiO//2

OBSERVATION OF REACTIVE SURFACE DEFECT SITES.

Robert Caracciolo, Steve Garofalini

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The adsorption of potassium onto a clean silica surface has been studied by X-ray photoelectron spectroscopy (XPS). The fracture surface of silica was cleaned by Ar** plus sputtering and exposed to potassium metal vapor for 10-s intervals up to 50 s, resulting in 0. 2 to 2 monolayer coverage. High-resolution XPS spectra were recorded for the K 2p, O 1s, and Si 2p photoelectrons at each potassium exposure. Potassium uptake curves were generated from peak areas which suggest the mechanism of adsorption. Curve synthesis techniques were employed on the O 1s spectra to identify the various chemical states present. A decrease in a reactive state is observed as the number of nonbridging oxygen states increases. Angle-resolved XPS was also used to determine the relative position, with respect to depth, of these reactive sites, showing that they are at a higher concentration near the surface.

Original languageEnglish
JournalJournal of the American Ceramic Society
Volume71
Issue number7
Publication statusPublished - Jul 1988

Fingerprint

Surface defects
Potassium
X ray photoelectron spectroscopy
Adsorption
Silicon Dioxide
Silica
Photoelectrons
Sputtering
Monolayers
Metals
Vapors
Oxygen

ASJC Scopus subject areas

  • Ceramics and Composites

Cite this

@article{a81fed7726404342a8467ff85b1ecf30,
title = "X-RAY PHOTOELECTRON SPECTROSCOPY ANALYSIS OF POTASSIUM ADSORPTION ONTO nu -SiO//2: OBSERVATION OF REACTIVE SURFACE DEFECT SITES.",
abstract = "The adsorption of potassium onto a clean silica surface has been studied by X-ray photoelectron spectroscopy (XPS). The fracture surface of silica was cleaned by Ar** plus sputtering and exposed to potassium metal vapor for 10-s intervals up to 50 s, resulting in 0. 2 to 2 monolayer coverage. High-resolution XPS spectra were recorded for the K 2p, O 1s, and Si 2p photoelectrons at each potassium exposure. Potassium uptake curves were generated from peak areas which suggest the mechanism of adsorption. Curve synthesis techniques were employed on the O 1s spectra to identify the various chemical states present. A decrease in a reactive state is observed as the number of nonbridging oxygen states increases. Angle-resolved XPS was also used to determine the relative position, with respect to depth, of these reactive sites, showing that they are at a higher concentration near the surface.",
author = "Robert Caracciolo and Steve Garofalini",
year = "1988",
month = "7",
language = "English",
volume = "71",
journal = "Journal of the American Ceramic Society",
issn = "0002-7820",
publisher = "Wiley-Blackwell",
number = "7",

}

TY - JOUR

T1 - X-RAY PHOTOELECTRON SPECTROSCOPY ANALYSIS OF POTASSIUM ADSORPTION ONTO nu -SiO//2

T2 - OBSERVATION OF REACTIVE SURFACE DEFECT SITES.

AU - Caracciolo, Robert

AU - Garofalini, Steve

PY - 1988/7

Y1 - 1988/7

N2 - The adsorption of potassium onto a clean silica surface has been studied by X-ray photoelectron spectroscopy (XPS). The fracture surface of silica was cleaned by Ar** plus sputtering and exposed to potassium metal vapor for 10-s intervals up to 50 s, resulting in 0. 2 to 2 monolayer coverage. High-resolution XPS spectra were recorded for the K 2p, O 1s, and Si 2p photoelectrons at each potassium exposure. Potassium uptake curves were generated from peak areas which suggest the mechanism of adsorption. Curve synthesis techniques were employed on the O 1s spectra to identify the various chemical states present. A decrease in a reactive state is observed as the number of nonbridging oxygen states increases. Angle-resolved XPS was also used to determine the relative position, with respect to depth, of these reactive sites, showing that they are at a higher concentration near the surface.

AB - The adsorption of potassium onto a clean silica surface has been studied by X-ray photoelectron spectroscopy (XPS). The fracture surface of silica was cleaned by Ar** plus sputtering and exposed to potassium metal vapor for 10-s intervals up to 50 s, resulting in 0. 2 to 2 monolayer coverage. High-resolution XPS spectra were recorded for the K 2p, O 1s, and Si 2p photoelectrons at each potassium exposure. Potassium uptake curves were generated from peak areas which suggest the mechanism of adsorption. Curve synthesis techniques were employed on the O 1s spectra to identify the various chemical states present. A decrease in a reactive state is observed as the number of nonbridging oxygen states increases. Angle-resolved XPS was also used to determine the relative position, with respect to depth, of these reactive sites, showing that they are at a higher concentration near the surface.

UR - http://www.scopus.com/inward/record.url?scp=0024053795&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0024053795&partnerID=8YFLogxK

M3 - Article

VL - 71

JO - Journal of the American Ceramic Society

JF - Journal of the American Ceramic Society

SN - 0002-7820

IS - 7

ER -